| Vapour-based processing of hole-conductor-free CH3NH3PbI3 perovskite/C-60 fullerene planar solar cells | |
Hu, Hao1,3; Wang, Dong1,3; Zhou, Yuanyuan2; Zhang, Jiliang4; Lv, Siliu1; Pang, Shuping1 ; Chen, Xiao1; Liu, Zhihong1; Padture, Nitin P.2; Cui, Guanglei1
| |
| 2014 | |
| 发表期刊 | RSC ADVANCES
 |
| 卷号 | 4期号:55页码:28964-28967 |
| 摘要 | A new sequential-vapour-deposition method is demonstrated for the growth of high-quality CH3NH3PbI3 perovskite films. This has enabled the all-vapour, low-temperature fabrication of hole-conductor-free planar perovskite solar cells consisting of only a CH3NH3PbI3/C-60 bi-layer sandwiched between two electrical contacts, with a power conversion efficiency of 5.4%. |
| 文章类型 | Article |
| WOS标题词 | Science & Technology ; Physical Sciences |
| DOI | 10.1039/c4ra03820g |
| 关键词[WOS] | LIGHT ; DEPOSITION ; EFFICIENCY ; ELECTRON |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS研究方向 | Chemistry |
| WOS类目 | Chemistry, Multidisciplinary |
| WOS记录号 | WOS:000339554500024 |
| 引用统计 | |
| 文献类型 | 期刊论文 |
| 条目标识符 | http://ir.qibebt.ac.cn/handle/337004/6239 |
| 专题 | 仿生与固态能源系统研究组 |
| 作者单位 | 1.Chinese Acad Sci, Qingdao Inst Bioenergy & Bioproc Technol, Qingdao 266101, Peoples R China 2.Brown Univ, Sch Engn, Providence, RI 02912 USA 3.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 4.City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China |
| 推荐引用方式 GB/T 7714 | Hu, Hao,Wang, Dong,Zhou, Yuanyuan,et al. Vapour-based processing of hole-conductor-free CH3NH3PbI3 perovskite/C-60 fullerene planar solar cells[J]. RSC ADVANCES,2014,4(55):28964-28967. |
| APA | Hu, Hao.,Wang, Dong.,Zhou, Yuanyuan.,Zhang, Jiliang.,Lv, Siliu.,...&Cui, Guanglei.(2014).Vapour-based processing of hole-conductor-free CH3NH3PbI3 perovskite/C-60 fullerene planar solar cells.RSC ADVANCES,4(55),28964-28967. |
| MLA | Hu, Hao,et al."Vapour-based processing of hole-conductor-free CH3NH3PbI3 perovskite/C-60 fullerene planar solar cells".RSC ADVANCES 4.55(2014):28964-28967. |
| 条目包含的文件 | 下载所有文件 | |||||
| 文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
| Vapour-based process（1437KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | 浏览 下载 | |
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。
修改评论