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Local Probe Oxidation of Self-Assembled Monolayers on Hydrogen-Terminated Silicon
Yang, Menglong2,3; Wouters, Daan1,4; Giesbers, Marcel2; Schubert, Ulrich S.1,5; Zuilhof, Han2
2009-10-01
发表期刊ACS NANO
卷号3期号:10页码:2887-2900
摘要Local probe oxidation experiments by conductive AFM have been performed on a hexadecyl monolayer and a N-hydroxysuccinimide (NHS)-ester-functionalized undecyl (NHS-UA) monolayer assembled on hydrogen-terminated (i.e., unoxidized) silicon. The oxidation conditions for the mild oxidation of the top terminal groups of monolayers and the deep oxidation of the underlying silicon into silicon oxide were investigated. The results show that the bias threshold for the AFM tip-induced oxidation of the top groups of monolayers on oxide-free silicon can be reduced by 2 V for the methyl-terminated hexadecyl monolayer and even by 3.5 V for the active NHS-ester-terminated undecyl monolayer, in comparison to a methyl-terminated octadecyl trichlorosilane (OTS) monolayer on oxidized silicon. Upon such localmild oxidation, the active NHS ester group of the NHS-UAmonolayer is selectively cleaved off to generate carboxyl-containing monolayer nanopatterns, opening further possibilities for subsequent patterned multifunctionalization.; Local probe oxidation experiments by conductive AFM have been performed on a hexadecyl monolayer and N-hydroxysuccinimide (NHS)-ester-functionalized undecyl (NHS-UA) monolayer assembled on hydrogen-terminated (i.e., unoxidized) silicon. The oxidation conditions for the mild oxidation of the top terminal groups of monolayers and the deep oxidation of the underlying silicon into silicon oxide were investigated. The results show that the bias threshold for the AFM tip-induced oxidation of the top groups of monolayers on oxide-free silicon can be reduced by 2 V for the methyl-terminated hexadecyl monolayer and even by 3.5 V for the active NHS-ester-terminated undecyl monolayer, in comparison to a methyl-terminated octadecyl trichlorosilane (OTS) monolayer on oxidized silicon. Upon such local mild oxidation, the active NHS ester group of the NHS-UA monolayer is selectively cleaved off to generate carboxyl-containing monolayer nanopatterns, opening further possibilities for subsequent patterned multifunctionalization.
文章类型Article
关键词Local Probe Oxidation Nanolithography Nanopatterning Self-assembled Monolayer (Sam) Hydrogen-terminated Silicon N-hydroxysuccinimide (Nhs) Xps Analysis
WOS标题词Science & Technology ; Physical Sciences ; Technology
DOI10.1021/nn9007059
关键词[WOS]ATOMIC-FORCE MICROSCOPY ; COVALENTLY ATTACHED MONOLAYERS ; LINKED ORGANIC MONOLAYERS ; EXTREMELY MILD ATTACHMENT ; FIELD-INDUCED OXIDATION ; ALKYL MONOLAYERS ; CONSTRUCTIVE NANOLITHOGRAPHY ; ANODIZATION LITHOGRAPHY ; CHEMICAL-MODIFICATION ; MOLECULAR SIMULATION
收录类别SCI
语种英语
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science
WOS类目Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
WOS记录号WOS:000271106100006
引用统计
文献类型期刊论文
条目标识符http://ir.qibebt.ac.cn/handle/337004/602
专题公共实验室
作者单位1.Eindhoven Univ Technol, Lab Macromol Chem & Nanosci, NL-5600 MB Eindhoven, Netherlands
2.Wageningen Univ, Organ Chem Lab, NL-6703 HB Wageningen, Netherlands
3.Chinese Acad Sci, Qingdao Inst Bioenergy & Bioproc Technol, Qingdao 266101, Peoples R China
4.Dutch Polymer Inst, NL-5600 MB Eindhoven, Netherlands
5.Univ Jena, Lab Organ & Macromol Chem, D-07743 Jena, Germany
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Yang, Menglong,Wouters, Daan,Giesbers, Marcel,et al. Local Probe Oxidation of Self-Assembled Monolayers on Hydrogen-Terminated Silicon[J]. ACS NANO,2009,3(10):2887-2900.
APA Yang, Menglong,Wouters, Daan,Giesbers, Marcel,Schubert, Ulrich S.,&Zuilhof, Han.(2009).Local Probe Oxidation of Self-Assembled Monolayers on Hydrogen-Terminated Silicon.ACS NANO,3(10),2887-2900.
MLA Yang, Menglong,et al."Local Probe Oxidation of Self-Assembled Monolayers on Hydrogen-Terminated Silicon".ACS NANO 3.10(2009):2887-2900.
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